Very hard low-profile polishing sponge of strongly abrasive (heavy cutting) properties. Polishing Pad has a structure of an open-cell that is why cutting force at any time is maintained at the same level. Sponge with all paint coatings.The heat generated by the screw with an additional hole in the central part of the falls hat secures the “backing plate” is carried away and polishing sponge properties are retained for a long time. The largest performance gained in conjunction with polishing pastes with very high and high-abrasion. Polishing Pad dedicated for orbital machine, Dual-Action.